Albuquerque, NM, United States of America

Jeffrey T Figiel

This inventor holds 1 USPTO granted patent. Top assignee: Sandia Corporation. Active years: 2014.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of Jeffrey T. Figiel

Introduction

Jeffrey T. Figiel is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of materials science, particularly in the growth of group III-nitrides on copper substrates. His innovative approach has implications for various applications in electronics and optoelectronics.

Latest Patents

Jeffrey T. Figiel holds a patent for a method to grow group III-nitrides on copper using passivation layers. This patent, which is a crucial advancement in the field, allows for the growth of group III-nitride epilayers directly on copper substrates. For instance, single crystalline c-plane GaN can be grown on Cu (110) substrates using Metal-Organic Chemical Vapor Deposition (MOCVD). The process relies on a low-temperature AlN passivation layer to prevent any alloying reaction between gallium and copper. This innovative method has the potential to enhance the performance of electronic devices.

Career Highlights

Jeffrey T. Figiel is associated with Sandia Corporation, where he continues to work on cutting-edge research and development projects. His expertise in materials science and engineering has positioned him as a valuable asset to his team and the broader scientific community.

Collaborations

Throughout his career, Jeffrey has collaborated with esteemed colleagues, including Qiming Li and George T. Wang. These collaborations have fostered a productive environment for innovation and have led to advancements in their respective fields.

Conclusion

Jeffrey T. Figiel's contributions to the field of materials science, particularly through his patent on growing group III-nitrides on copper, highlight his innovative spirit and dedication to advancing technology. His work at Sandia Corporation and collaborations with fellow researchers further emphasize his impact on the scientific community.

Profile summary based on public USPTO records.
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