Dorset, United Kingdom

Jeffrey R Willshere

This inventor holds 2 USPTO granted patents. Top assignee: Dek International Gmbh. Active years: 2011-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeffrey R Willshere. Retrieved from https://idiyas.com/inventor/jeffrey-r-willshere

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011-2012

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2 patents (USPTO):Explore Patents

Title: The Innovations of Jeffrey R Willshere: Pioneering Production Line Solutions

Introduction

Jeffrey R Willshere is a notable inventor based in Dorset, GB, recognized for his contributions to the field of production line technology. With two patents to his name, Willshere is making strides in optimizing manufacturing processes.

Latest Patents

His most recent patents focus on a Production Line Assembly Module, which aims to enhance the assembly process in manufacturing environments. This innovative approach has the potential to streamline operations and improve overall efficiency on production floors.

Career Highlights

Currently, Jeffrey is employed at Dek International GmbH, a company dedicated to providing cutting-edge solutions in manufacturing technologies. His role allows him to directly impact the efficiency of production lines, showcasing his skills and passion for innovation.

Collaborations

Jeffrey collaborates closely with his coworker, Richard Murray, enhancing their combined expertise in developing new technologies. Their teamwork has been instrumental in pushing the boundaries of traditional manufacturing practices.

Conclusion

In conclusion, Jeffrey R Willshere’s commitment to innovation in production line technology has established him as a significant figure in his field. With his ongoing work and patents, he continues to shape the future of manufacturing efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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