Hillsboro, OR, United States of America

Jeffrey Miles Tan

Average Co-Inventor Count = 12.0

ph-index = 1


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: **Jeffrey Miles Tan: Innovator in Integrated Circuit Technology**

Introduction

Jeffrey Miles Tan, based in Hillsboro, Oregon, is an accomplished inventor known for his significant contributions to the field of integrated circuit technology. With a strong foundation in innovation, he holds one patent that showcases his expertise and creativity in this advanced area of electronics.

Latest Patents

Tan's patent includes a groundbreaking fabrication method for gate-all-around integrated circuit structures that incorporate pre-spacer deposition cut gates. This innovative design features an integrated circuit structure with two vertical arrangements of horizontal nanowires. The first and second gate stacks are strategically positioned above these arrangements, with a gap separating the two. Additionally, the intricate dielectric structure provides enhanced performance by forming gate spacers along the gate stacks and filling the gap seamlessly, contributing to the advancement of integrated circuit technology.

Career Highlights

Currently, Jeffrey Miles Tan is employed at Intel Corporation, a leading company in the semiconductor industry known for its ongoing commitment to innovation and technological advancement. His work has contributed to the development of cutting-edge solutions that push the boundaries of what is possible in integrated circuits.

Collaborations

Throughout his career, Tan has collaborated with notable coworkers such as Leonard P. Guler and Michael K. Harper. These partnerships exemplify the importance of teamwork in the process of innovation, allowing for the exchange of ideas and expertise that ultimately lead to enhanced inventions.

Conclusion

Jeffrey Miles Tan stands as a significant figure in the realm of innovations, particularly in integrated circuits. His patent for fabrication techniques that improve gate-all-around structures highlights his commitment to advancing technology. As a key member of Intel Corporation, Tan continues to shape the future of electronic devices through his inventive contributions.

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