Newark, DE, United States of America

Jeffrey Lawrence

This inventor holds 1 USPTO granted patent. Top assignee: University of Delaware. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeffrey Lawrence. Retrieved from https://idiyas.com/inventor/jeffrey-lawrence-lhrrns4f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Innovations by Jeffrey Lawrence

Introduction

Jeffrey Lawrence is an accomplished inventor based in Newark, Delaware. He has made significant contributions to the field of molding systems and processes. His innovative approach has led to the development of a unique patent that enhances the efficiency of mold systems.

Latest Patents

Jeffrey Lawrence holds a patent for a molding system that includes a gate control system. This system selectively deforms a deformable member to close one or more injection gates and/or vent gates in a mold platen. The design ensures that the injection gates are opened and closed by engaging the deformable member, which is strategically located between the gate control system and the curing fluid. This configuration prevents the curing fluid from contacting the gate control system, thereby improving the overall functionality of the mold.

Career Highlights

Jeffrey Lawrence is affiliated with the University of Delaware, where he continues to work on innovative projects. His expertise in molding systems has positioned him as a valuable asset in the field of engineering and technology.

Collaborations

Some of his notable coworkers include Suresh Advani and Mathieu Devillard, who share a commitment to advancing research and innovation in their respective fields.

Conclusion

Jeffrey Lawrence's contributions to molding systems and processes exemplify the spirit of innovation. His patent reflects a deep understanding of engineering principles and a dedication to improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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