Company Filing History:
Years Active: 2016
Title: The Innovations of Jeffrey D. Fogle: A Pioneer in Photoacid Generator Technology
Introduction
Jeffrey D. Fogle, based in Beavercreek, OH, is a notable inventor in the field of photoacid generator compounds. His work has significantly impacted microfabrication applications, particularly through his innovative solutions that enhance photoresist compositions.
Latest Patents
Jeffrey D. Fogle holds a patent for "Sulfonic acid derivative compounds as photoacid generators in resist applications." This patent introduces novel photoacid generator compounds that are integral to the formulation of photoresist compositions. The invention elaborates on methods for making and utilizing these compounds, which are essential components in chemically amplified resist compositions used in various microfabrication applications.
Career Highlights
Fogle's impressive career includes his association with Heraeus Precious Metals North America Daychem LLC, where he contributes to the advancement of materials used in electronics and semiconductor manufacturing. His expertise in chemical engineering and material science has allowed him to make meaningful contributions in a competitive industry.
Collaborations
Throughout his career, Jeffrey D. Fogle has collaborated with esteemed colleagues such as Yongqiang Zhang and Ram B. Sharma. These collaborations have fostered innovation and have aided in the development and refinement of technologies that are pivotal to the industry.
Conclusion
In conclusion, Jeffrey D. Fogle's work exemplifies the fusion of theoretical knowledge and practical application in the field of microfabrication. His patented innovations in photoacid generator compounds continue to play a crucial role in enhancing the performance and efficiency of photoresist materials, solidifying his status as a leading inventor in this domain.