The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Sep. 18, 2014
Applicant:

Heraeus Precious Metals North America Daychem Llc, Vandalia, OH (US);

Inventors:

Yongqiang Zhang, Longmont, CO (US);

Ram B. Sharma, Centerville, OH (US);

Rachael Stuck, Bellbrook, OH (US);

Daniel Greene, West Carrollton, OH (US);

Rakesh Gupta, Dayton, OH (US);

Jeffrey D. Fogle, Beavercreek, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 311/07 (2006.01); G03F 7/004 (2006.01); G03F 7/027 (2006.01); G03F 7/038 (2006.01); C07D 221/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07C 311/07 (2013.01); C07D 221/14 (2013.01); G03F 7/0384 (2013.01);
Abstract

Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.


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