Company Filing History:
Years Active: 2012-2019
Title: Inventor Spotlight: Jeffrey C. Ramer
Introduction
Jeffrey C. Ramer, located in Sunnyvale, California, is an innovative inventor renowned for his significant contributions to the field of chemical vapor deposition systems. With a total of five patents under his belt, his work primarily focuses on enhancing the efficiency and effectiveness of rotating disk reactors used in the growth of epitaxial layers on substrates.
Latest Patents
Among his latest advancements is the patent titled "Alkyl Push Flow for Vertical Flow Rotating Disk Reactors." This invention introduces a method whereby gas is directed towards substrates at different radial distances with consistent flow rates and densities. The inventive process allows portions of the substrate surfaces, situated at varying distances from the axis of rotation, to receive a uniform amount of reactant gas per unit area. By employing a combination of carrier gases with different molecular weights, Jeffrey's system eliminates laminar recirculation areas, leading to uniform deposition and growth of epitaxial layers. His work addresses critical challenges in reactor design, enabling enhanced performance in industrial applications.
Career Highlights
Jeffrey has worked with notable companies such as Bridgelux Incorporated and Veeco Instruments Inc., where he has significantly impacted the development of advanced technologies. His expertise in reactor design and gas flow dynamics has been instrumental in pushing the boundaries of current research and applications in the semiconductor industry.
Collaborations
Throughout his career, Jeffrey has collaborated with esteemed professionals, including Vahid S. Moshtagh and Michael Murphy. These partnerships have fostered a rich environment for innovation and have contributed to several successful projects in the chemical vapor deposition technology space.
Conclusion
With a strong portfolio of patents and a career marked by significant contributions to the field, Jeffrey C. Ramer continues to be a vital figure in the realm of chemical vapor deposition. His innovative solutions and collaborative spirit not only advance technology but also inspire future generations of inventors.
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