Jeffrey B Hurst

Title: The Innovations of Jeffrey B Hurst

Introduction

Jeffrey B Hurst is an accomplished inventor based in Cedar Park, TX (US). He holds 2 patents that showcase his expertise in optical metrology and calibration methodologies. His work has significantly contributed to advancements in the field of nanoimprint technology.

Latest Patents

One of Hurst's latest patents is titled "Optical vacuum ultra-violet wavelength nanoimprint metrology." This patent describes an optical metrology apparatus designed for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light. The apparatus includes focusing optics that direct light onto the sample and collect the reflected light to record an optical response from the nanoimprint structures. The sample stage is engineered to support the sample while allowing for rotation, ensuring that the orientation of the nanoimprint structures remains fixed relative to the focusing optics, thus eliminating polarization effects.

Another significant patent is the "Automated calibration methodology for VUV metrology system." This invention features a calibration pad with multiple calibration sites. It allows for the use of a particular calibration site until it is deemed unacceptable due to contamination or other factors. The methodology includes various techniques to determine when to switch to a different calibration site, ensuring the reliability of the calibration process.

Career Highlights

Throughout his career, Jeffrey B Hurst has worked with notable companies, including Jordan Valley Semiconductors Ltd. and Jordan Valley Semiconductor Ltd. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the semiconductor industry.

Collaborations

Hurst has collaborated with several professionals in his field, including Phillip Walsh and Dale A Harrison. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Jeffrey B Hurst's contributions to optical metrology and calibration methodologies highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving measurement techniques in the semiconductor industry.