This inventor holds 1 USPTO granted patent. Top assignee: Micron Technology Incorporated. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Jeff N Fuss: Innovator in Chemical Vapor Deposition Technology
Introduction
Jeff N Fuss is a notable inventor based in Meridian, ID (US). He has made significant contributions to the field of chemical vapor deposition, a crucial process in various manufacturing applications. His innovative work has led to the development of a patented technology that enhances the efficiency and effectiveness of chemical vapor deposition methods.
Latest Patents
Jeff N Fuss holds a patent for a "Chemical vapor deposition apparatus and methods." This invention encompasses a chemical vapor deposition apparatus and methods for depositing an amorphous carbon layer on a substrate. It also includes methods for depositing silicon nitride (SiN) and silicon oxynitride (SiON) on a substrate. The patent details the use of a gas output manifold with multiple gas inputs and outputs to optimize the deposition process. Additionally, it describes the implementation of a remote plasma generator and cleaning gas input lines to ensure the quality of the deposited layers.
Career Highlights
Jeff N Fuss is associated with Micron Technology Incorporated, a leading company in the semiconductor industry. His work at Micron has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology that are vital for modern electronics. His expertise in chemical vapor deposition has positioned him as a key player in the development of new materials and processes.
Collaborations
Jeff has collaborated with talented individuals such as Zhiping Yin and Kevin T Hamer. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Jeff N Fuss is a distinguished inventor whose work in chemical vapor deposition technology has made a significant impact on the industry. His patented methods and apparatus are essential for the advancement of semiconductor manufacturing processes. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile