This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Jeff McMurray: Innovator in Semiconductor Fabrication
Introduction
Jeff McMurray is a notable inventor based in Layton, UT (US). He has made significant contributions to the field of semiconductor fabrication. His innovative work has led to the development of a unique patent that addresses particle emission analysis during fabrication steps.
Latest Patents
Jeff McMurray holds a patent titled "Particle emission analysis for semiconductor fabrication steps." This patent describes a structure and method for operating a detecting structure that includes N detectors, where N is a positive integer. The method involves performing a fabrication step simultaneously on the detecting structure and M product structures within a fabrication tool. This process results in a particle-emitting layer on the detecting structure, which is distinct from the M product structures, which are identical and where M is also a positive integer. The impact of the emitted particles from the particle-emitting layer on the detecting structure is analyzed after the fabrication step is completed. Jeff has 1 patent to his name.
Career Highlights
Jeff McMurray is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and innovate within the semiconductor industry. His contributions have been instrumental in advancing the technology used in semiconductor fabrication.
Collaborations
Throughout his career, Jeff has collaborated with talented individuals such as Cyril Cabral, Jr. and Cristina Plettner. These collaborations have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Jeff McMurray is a distinguished inventor whose work in semiconductor fabrication has made a significant impact. His patent on particle emission analysis showcases his innovative approach to solving complex problems in the industry. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile