Hayward, CA, United States of America

Jeff Dewayne Lyons

This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeff Dewayne Lyons. Retrieved from https://idiyas.com/inventor/jeff-dewayne-lyons

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Jeff Dewayne Lyons: Innovator in PVD Deposition Technology

Introduction

Jeff Dewayne Lyons is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of physical vapor deposition (PVD) technology. His innovative approach has led to advancements in the deposition of titanium and titanium nitride layers, which are crucial for integrated circuit substrates.

Latest Patents

Jeff Dewayne Lyons holds a patent for a method titled "PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter." This patent describes a process where titanium and titanium nitride layers are formed on an integrated circuit substrate using a titanium target in non-nitrided mode within a hollow cathode magnetron apparatus. Notably, neither a collimator nor a shield is utilized in this process. The technology allows for the deposition of Ti and TiN layers in vias and trenches with aspect ratios of up to 5:1, showcasing its efficiency and effectiveness.

Career Highlights

Jeff is currently employed at Novellus Systems Incorporated, a company known for its innovative solutions in semiconductor manufacturing. His work at Novellus has positioned him as a key player in advancing deposition technologies that enhance the performance and reliability of integrated circuits.

Collaborations

Throughout his career, Jeff has collaborated with talented individuals such as Gerard Chris D'Couto and George Tkach. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies in the semiconductor industry.

Conclusion

In summary, Jeff Dewayne Lyons is a distinguished inventor whose work in PVD deposition technology has made a significant impact on the semiconductor manufacturing industry. His innovative patent and contributions to Novellus Systems Incorporated highlight his expertise and commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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