Suwon, South Korea

Jeeho Park

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jeeho Park. Retrieved from https://idiyas.com/inventor/jeeho-park-el594ace

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Jeeho Park

Introduction

Jeeho Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of radio frequency integrated circuits (RFIC). His work focuses on enhancing the reliability and performance of electronic devices through innovative testing methods.

Latest Patents

Jeeho Park holds a patent for a "Method and apparatus for detecting circuit defects." This patent relates to an RFIC apparatus, specifically addressing the detection of defects in RF circuits. The invention includes a test circuit, a test apparatus, and a method for estimating or determining DC gain during testing. This advancement allows for the identification of circuit defects based on the estimated or determined DC gain, improving the overall quality of RF circuits.

Career Highlights

Throughout his career, Jeeho Park has worked with leading technology companies, including Samsung Electronics Co., Ltd. and LG Display Co., Ltd. His experience in these organizations has contributed to his expertise in circuit design and testing methodologies.

Collaborations

Jeeho Park has collaborated with talented individuals in his field, including Jihoon Kim and Sehyug Jeon. These partnerships have fostered innovation and the development of advanced technologies in RFIC.

Conclusion

Jeeho Park's contributions to the field of RFIC and his innovative patent demonstrate his commitment to advancing technology. His work continues to influence the industry and improve electronic device performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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