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Jean-Paul Booth

USPTO Granted Patents = 16 (Patent Applications = 1)

EPO Patents = 4 (Patent Applications = 3)

Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 82(Granted Patents)

Location History:

Gieres, FR (1999)
Oakland, CA (US) (2012 - 2013)
Essone, FR (2014)
Essonne, FR (2012 - 2015)
Boullay les Troux, FR (2014 - 2019)
Boullay les Trous, FR (2020)

Company Filing History:

12 out of 3,777

Lam Research Corporation

patents

4 out of 5,081

Centre National De La Recherche Scientifique

where one patent can have more than one assignee

Years Active: 1999-2020

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16 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10796885 - Circuit for impedance matching between a generator and a load at multiple frequencies, assembly comprising such a circuit and related use (2020-10-06),

2. 10319565 - Method and system for controlling ion flux in an RF plasma (2019-06-11),

3. 9153421 - Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber (2015-10-06),

4. 9129779 - Processing system for detecting in-situ arcing events during substrate processing (2015-09-08),

5. 8968838 - Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation (2015-03-03),

6. 8894804 - Plasma unconfinement sensor and methods thereof (2014-11-25),

7. 8849585 - Methods for automatically characterizing a plasma (2014-09-30),

8. 8780522 - Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof (2014-07-15),

9. 8547085 - Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber (2013-10-01),

10. 8358416 - Methods and apparatus for normalizing optical emission spectra (2013-01-22),

11. 8179152 - Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber (2012-05-15),

12. 8164353 - RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber (2012-04-24),

13. 8164349 - Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof (2012-04-24),

14. 8159233 - Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber (2012-04-17),

15. 8144328 - Methods and apparatus for normalizing optical emission spectra (2012-03-27),

Title: Inventor Spotlight: Jean-Paul Booth

Introduction

Jean-Paul Booth is a prominent inventor hailing from Essonne, France. With a remarkable portfolio comprising 16 patents, he has made significant contributions to the fields of electrical engineering and plasma technology. His innovative concepts have advanced the way we understand and implement circuits and plasma processes.

Latest Patents

Among his latest patents are:

1. **Circuit for impedance matching between a generator and a load at multiple frequencies** - This invention pertains to a circuit designed to achieve simultaneous impedance matching between a generator (G) and a load (CH) for a power supply signal containing at least two distinct frequencies.

2. **Method and system for controlling ion flux in an RF plasma** - This method entails generating an ion flow asymmetry in a capacitively coupled radiofrequency plasma reactor. It includes energizing a first electrode using a radiofrequency voltage waveform that approximates a standardized sawtooth radiofrequency function. This innovative design leads to distinct ion flow behaviors between electrodes under specific gas pressures.

Career Highlights

Jean-Paul Booth's career has been marked by his work at esteemed organizations. He has been affiliated with Lam Research Corporation, where he honed his skills in high-technology sectors, and the Centre National De La Recherche Scientifique, a leading research institution in France known for its state-of-the-art scientific endeavors.

Collaborations

Throughout his career, Booth has collaborated with notable peers, including Douglas L. Keil and Erik Johnson, both of whom bring significant expertise to their respective fields. These collaborations have fostered environments ripe for innovation and have contributed to the success of his projects.

Conclusion

In summary, Jean-Paul Booth stands out as an influential inventor whose work continues to shape advancements in technology. His latest patents demonstrate a commitment to reducing complexities in electrical systems and enhancing plasma processes. Through his contributions and collaborations, Booth remains a noteworthy figure in the landscape of modern innovation.

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