Location History:
- Uriage, FR (1991)
- Meylan, FR (1993)
- Theys, FR (2005)
Company Filing History:
Years Active: 1991-2005
Title: Innovations of Jean Palleau
Introduction
Jean Palleau is a notable inventor based in Theys, France. He has made significant contributions to the field of materials science, particularly in the area of dielectric materials and metal layer processing. With a total of 3 patents to his name, Palleau's work has implications for various technological applications.
Latest Patents
One of Palleau's latest patents is a method for depositing a silicon-containing dielectric material on copper. This innovative method involves placing a structure in a Chemical Vapor Deposition (CVD) chamber, where a first gas forms a precursor for the dielectric material. This gas contains an element that can contaminate copper. A second gas is then added, which reacts with the first gas to form the dielectric material while preventing copper contamination through the addition of a third gas.
Another significant patent is the mechanical lift-off process of a metal layer on a polymer. This process is designed to remove a portion of a metal layer formed on a dielectric polymer substrate. It involves selecting an intermediate layer material with low adhesivity, applying mechanical stress to detach the metal at the interface, and chemically removing the intermediate layer.
Career Highlights
Throughout his career, Jean Palleau has worked with esteemed organizations such as the French State and the Atomic Energy Commission (Commissariat à l'énergie atomique). His experience in these institutions has allowed him to develop and refine his innovative techniques in material processing.
Collaborations
Palleau has collaborated with notable colleagues, including Joaquim Torres and Noureddine Bourhila. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Jean Palleau's contributions to the field of materials science through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence various applications in the industry.