Saint-Clement-de-Riviere, France

Jean Camassel


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: **Innovator Spotlight: Jean Camassel**

Introduction

Jean Camassel is an esteemed inventor based in Saint-Clement-de-Riviere, France. He has made significant contributions to the field of metrology through his innovative work on Hall effect sensors. With a unique blend of scientific expertise and practical application, he stands out as a pivotal figure in his domain.

Latest Patents

Camassel holds a patent for a highly advanced Hall effect sensor. This sensor is designed with a metrological sensitivity to temperature that is less than 250 parts per million per degree Celsius. Notably, it also boasts a high Hall effect coefficient for temperatures exceeding 200 degrees Celsius. The sensor is constructed in a multilayer structure, featuring a thin active layer deposited on a substrate made of monocrystalline silicon carbide (SiC). The thin active layer itself is composed of a weakly type n-doped silicon carbide (SiC) semiconductor operating in the exhaustion regime.

Career Highlights

Currently, Jean Camassel is affiliated with the Centre National de la Recherche Scientifique, a leading research institution in France. His work at this respected organization underscores his commitment to advancing scientific research and innovation through meticulous development and testing of new technologies.

Collaborations

Throughout his career, Camassel has collaborated with notable colleagues, including Jean-Louis Robert and Julien Pernot. These partnerships illustrate the cooperative spirit of innovation within research institutions, as they work together to push the boundaries of technology and improve existing methodologies.

Conclusion

Jean Camassel exemplifies the qualities of a dedicated inventor and researcher. Through his innovative patents and collaborative efforts, he continues to influence the landscape of metrology and semiconductor technology. His commitment to excellence serves as an inspiration to both current and future innovators in the scientific community.

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