Yadkinville, NC, United States of America

Jay B Gaillard


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations of Jay B Gaillard

Introduction

Jay B Gaillard is an accomplished inventor based in Yadkinville, NC (US). He has made significant contributions to the field of substrate patterning through his innovative methods and devices. His work focuses on utilizing field emitted electrons to create micro- and nano-sized patterns on substrates.

Latest Patents

Gaillard holds a patent for "Substrate patterning by electron emission-induced displacement." This patent discloses methods and devices for patterning micro- and/or nano-sized pattern elements on a substrate using field emitted electrons from an element. The disclosed methods can also form nano- and micron-sized depressions in a substrate more economically than previous methods. His techniques include single-step methods that allow for the simultaneous creation and precise location of structures on a substrate. The application of a bias voltage between a probe tip and a substrate held at a close gap distance promotes current flow via field emissions. During a voltage pulse, and within predetermined energy levels and tip-to-surface gap distances, three-dimensional formations can be developed on the substrate surface. Gaillard has 1 patent to his name.

Career Highlights

Gaillard's career is marked by his dedication to advancing substrate patterning technologies. His innovative approaches have the potential to revolutionize the manufacturing processes in various industries. He is affiliated with Clemson University, where he continues to contribute to research and development in this field.

Collaborations

Some of his notable coworkers include Jason B Reppert and Bevan Craig Elliott. Their collaborative efforts have further enhanced the research and development of substrate patterning technologies.

Conclusion

Jay B Gaillard is a notable inventor whose work in substrate patterning has paved the way for more efficient manufacturing processes. His innovative methods and devices demonstrate the potential for advancements in micro- and nano-technology.

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