Mountain View, CA, United States of America

Jason T Stuck

USPTO Granted Patents = 6 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 27(Granted Patents)


Location History:

  • Mountain View, CA (US) (2005)
  • San Jose, CA (US) (2004 - 2015)

Company Filing History:


Years Active: 2004-2015

Loading Chart...
6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jason T. Stuck

Introduction

Jason T. Stuck is a prominent inventor based in Mountain View, CA. He has made significant contributions to the field of photolithography, holding a total of 6 patents. His work focuses on developing advanced materials and methods that enhance the efficiency and effectiveness of integrated circuit applications.

Latest Patents

Among his latest patents is the invention of an anti-reflective coating for photolithography. This innovative coating includes various components such as absorbing compounds and material modification agents, which are essential for optimizing performance at specific wavelengths like 365 nm, 248 nm, 193 nm, and 157 nm. Another notable patent involves coatings and hard mask compositions for integrated circuit applications. This invention describes a coating material that combines inorganic compounds with densifying agents to improve density, thereby enhancing the overall quality of the coating.

Career Highlights

Jason T. Stuck is currently employed at Honeywell International Inc., where he continues to push the boundaries of innovation in his field. His expertise in photolithography and material science has positioned him as a key player in the development of cutting-edge technologies.

Collaborations

Throughout his career, Jason has collaborated with talented individuals such as Joseph T. Kennedy and Hsueh Sung Tung. These partnerships have fostered a creative environment that has led to the successful development of numerous patents.

Conclusion

Jason T. Stuck's contributions to the field of photolithography and integrated circuit applications demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…