The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Nov. 12, 2002
Teresa Baldwin, Maricopa, AZ (US);
Joseph Kennedy, San Jose, CA (US);
Nancy Iwamoto, Ramona, CA (US);
Tadashi Nakano, Tokyo, JP;
William Bedwell, Brecksville, OH (US);
Jason Stuck, San Jose, CA (US);
Arlene Suedemeyer, San Jose, CA (US);
Mello Hebert, Hillsboro, OR (US);
Teresa Baldwin, Maricopa, AZ (US);
Joseph Kennedy, San Jose, CA (US);
Nancy Iwamoto, Ramona, CA (US);
Tadashi Nakano, Tokyo, JP;
William Bedwell, Brecksville, OH (US);
Jason Stuck, San Jose, CA (US);
Arlene Suedemeyer, San Jose, CA (US);
Mello Hebert, Hillsboro, OR (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.