Company Filing History:
Years Active: 2015
Title: Arlene Suedemeyer: Innovator in Photolithography
Introduction
Arlene Suedemeyer is a notable inventor based in San Jose, California. She has made significant contributions to the field of photolithography, particularly through her innovative patent that addresses the challenges associated with anti-reflective coatings.
Latest Patents
Suedemeyer holds a patent for an "Anti-reflective coating for photolithography and methods of preparation thereof." This invention involves anti-reflective coating materials for ultraviolet photolithography, which include various components such as absorbing compounds and material modification agents. These agents are essential for enhancing the performance of inorganic-based materials used in photolithography, particularly at wavelengths like 365 nm, 248 nm, 193 nm, and 157 nm.
Career Highlights
Arlene Suedemeyer is currently employed at Honeywell International Inc., where she continues to develop and refine her innovative ideas. Her work has positioned her as a key player in the advancement of photolithography technologies.
Collaborations
Throughout her career, Suedemeyer has collaborated with talented individuals such as Teresa Baldwin and Joseph T. Kennedy. These partnerships have contributed to her success and the development of her groundbreaking inventions.
Conclusion
Arlene Suedemeyer exemplifies the spirit of innovation in the field of photolithography. Her contributions through her patent and work at Honeywell International Inc. highlight her role as a leading inventor in this specialized area.