Honeywell International Inc.

Jason T Stuck

Hsueh Sung Tung

Joseph T Kennedy

Michael Van Der Puy

Wei T Huang

Andrew Joseph Poss

Yuon Chiu

Bo Li

Matthew H Luly

Nancy E Iwamoto

Timothy R Demmin

Gustavo Cerri

Tadashi Nakano

Teresa Baldwin

William B Bedwell

Franklin S Wong

Kim Do

Arlene Suedemeyer

Mello Hebert

Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.

Anti-reflective coating for photolithography and methods of preparation thereof

A coating material is described herein that includes at least one inorganic compound, and at least one densifying agent, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound. A method of producing a coating material is described herein that includes: providing at least one inorganic compound, providing at least one densifying agent, combining the at least one inorganic compound with the at least one densifying agent to form the coating material, wherein the densifying agent increases the density of the coating material as compared to the density of the at least one inorganic compound.

Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof

A sacrificial coating material includes: at least one inorganic compound, and at least one material modification agent, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry. A method of producing a sacrificial coating material includes: providing at least one inorganic compound, providing at least one material modification agent, combining the at least one inorganic compound with the at least one material modification agent to form the sacrificial coating material, wherein the sacrificial coating material is dissolvable in an alkaline-based chemistry or a fluorine-based chemistry, but not organic casting solvents commonly used in organic BARC materials.

Coating composition optimization for via fill and photolithography applications and methods of preparation thereof

Disclosed are improved fluorination processes and fluorine-containing compositions which involve introducing to one or more fluorination process compositions a water reactive agent in an amount and under conditions effective to decrease the amount of water in that composition. The water reactive agent is preferably introduced to the fluorination reaction process at a location proximate to the site of the fluorination reaction, or upstream of the fluorination reaction, in amounts and under conditions effective to produce a relatively lower concentration of water in the composition, and preferably throughout the fluorination process.

Method of removing water from hydrofluorocarbon manufacturing processes

Disclosed are improved fluorination processes and fluorine-containing compositions which involve introducing to one or more fluorination process compositions a water reactive agent in an amount and under conditions effective to decrease the amount of water in that composition. The water reactive agent is preferably introduced to the fluorination process at a location downstream of the fluorination reaction, in amounts and under conditions effective to produce a relatively lower concentration of water in the composition, and preferably throughout the fluorination process.

A process for preparing a fluorination catalyst using a low pressure activating step followed by a high pressure activating step.

Process for preparing fluorination catalyst

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Mountain View, CA, United States of America

Jason T Stuck