Company Filing History:
Years Active: 2002-2007
Title: Jason Price - Innovator in Chemical-Mechanical Polishing Technology
Introduction
Jason Price is a notable inventor based in Eugene, OR (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) technology. With a total of 3 patents to his name, Price has demonstrated his expertise and innovative spirit in developing advanced polishing solutions.
Latest Patents
One of Jason Price's latest patents is an "Apparatus and method for chemical-mechanical polishing (CMP) head having direct pneumatic wafer polishing pressure." This invention features a resilient pneumatic annular sealing bladder that is coupled for fluid communication to a first pressurized pneumatic fluid. It defines a first pneumatic zone and is attached to a first surface of the wafer stop plate adjacent to the retaining ring's interior cylindrical surface. This design allows for effective wafer support at the peripheral edge during polishing operations. The resilient pneumatic annular sealing bladder also defines a second pneumatic zone that extends between the first surface of the wafer stop plate and the wafer when attached to the polishing head. This innovative approach ensures that the wafer is securely held during both polishing and non-polishing periods, preventing excessive flexing from applied vacuum forces.
Career Highlights
Throughout his career, Jason Price has worked with prominent companies in the industry, including Ebara Corporation and Mitsubishi Materials Corporation. His experience in these organizations has allowed him to refine his skills and contribute to the advancement of CMP technology.
Collaborations
Jason has collaborated with talented individuals such as Gerard S. Maloney and Scott Chin. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
In summary, Jason Price is a distinguished inventor whose work in chemical-mechanical polishing technology has led to significant advancements in the field. His innovative patents and collaborations with industry professionals highlight his commitment to excellence and innovation.