Company Filing History:
Years Active: 2017-2018
Title: The Innovations of Jason J Lee
Introduction
Jason J Lee is an accomplished inventor based in Beaverton, OR (US). He has made significant contributions to the field of photolithography, particularly in the development of advanced light source parameter control methods. With a total of 2 patents to his name, Lee continues to push the boundaries of innovation in his industry.
Latest Patents
One of Jason J Lee's latest patents is focused on wafer-based light source parameter control. This innovative photolithography method involves instructing an optical source to produce a pulsed light beam. The process includes scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer effectively. During this scanning process, the system receives characteristics of the pulsed light beam at the wafer. Additionally, it gathers determined values of a physical property of the wafer for specific pulsed light beam characteristics. Based on this information, the performance parameters of the pulsed light beam can be modified during scanning, enhancing the overall efficiency and effectiveness of the lithography process.
Career Highlights
Jason J Lee is currently employed at Cymer, Inc., a leading company in the field of photolithography equipment. His work at Cymer has allowed him to collaborate with other talented professionals in the industry, further advancing the technology and methodologies used in photolithography.
Collaborations
Some of Jason J Lee's notable coworkers include Ivan Lalovic and Omar Zurita. Their collaborative efforts contribute to the innovative environment at Cymer, Inc., fostering advancements in photolithography technology.
Conclusion
Jason J Lee's contributions to the field of photolithography through his patents and work at Cymer, Inc. highlight his role as a significant innovator in the industry. His dedication to advancing technology continues to impact the field positively.
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