Alamo, CA, United States of America

Jason H Rollo


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Jason H Rollo: Innovator in Metrology Technology

Introduction

Jason H Rollo is a notable inventor based in Alamo, CA (US). He has made significant contributions to the field of metrology, particularly in enhancing the efficiency of metrology tools. His innovative approach has led to the development of a patented technology that optimizes the measurement process in substrate processing.

Latest Patents

Jason H Rollo holds a patent for an invention titled "Enhanced throughput of a metrology tool." This patent focuses on improving the throughput of a metrology module by measuring a first parameter of a processed substrate. Additional parameters are only measured if warranted by the analysis of the first parameter. This method allows for efficient processing by reporting data quickly when the first parameter falls within accepted tolerance levels. If the parameter is outside the acceptable range, further measurements are taken to ensure quality control.

Career Highlights

Jason is currently employed at Nanometrics Inc., where he applies his expertise in metrology technology. His work has been instrumental in advancing the capabilities of metrology tools, making them more efficient and reliable for various applications. With a focus on innovation, he continues to contribute to the field through his research and development efforts.

Collaborations

Jason collaborates with his coworker, Jaime Poris, to further enhance the technology and applications of metrology tools. Their combined efforts aim to push the boundaries of what is possible in substrate processing and measurement accuracy.

Conclusion

Jason H Rollo is a dedicated inventor whose work in metrology technology has led to significant advancements in the field. His patented invention demonstrates a commitment to improving efficiency and accuracy in substrate processing. Through his role at Nanometrics Inc. and collaboration with colleagues, he continues to drive innovation in metrology.

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