The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Feb. 21, 2003
Jason H. Rollo, Alamo, CA (US);
Jaime Poris, Boulder Creek, CA (US);
Jason H. Rollo, Alamo, CA (US);
Jaime Poris, Boulder Creek, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
The throughput of a metrology module is enhanced by measuring a first parameter of a processed substrate and only measuring additional parameters if warranted from an analysis of the first parameter. Thus, after a substrate is processed, a first parameter related to the processing is measured and analyzed. If the measured parameter falls within accepted tolerance, the data is reported and then next substrate is processed. If, however, the measured parameter falls outside the range of accepted tolerance, the second parameter or additional parameters are measured and analyzed. The data can then be reported, the processing of subsequent substrate stopped and/or the processing of subsequent substrates adjusted based on the analyzed data.