New Fairfield, CT, United States of America

Jason E Meiring


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Fishkill, NY (US) (2012)
  • New Fairfield, CT (US) (2011 - 2015)

Company Filing History:


Years Active: 2011-2015

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Jason E. Meiring: Innovator in Optical Modeling and Design

Introduction

Jason E. Meiring is a celebrated inventor based in New Fairfield, CT, USA, recognized for his contributions to the field of optical modeling and design. With a remarkable portfolio of four patents, Meiring has made significant advancements that enhance the precision of optical simulations and mask layouts used in various technologies.

Latest Patents

Among his latest innovations, Meiring has developed two notable patents. The first patent is titled "Optical model employing phase transmission values for sub-resolution assist features." This invention focuses on performing optical simulations using a calibrated printing model, where unique phase transmission values are designated for each type of sub-resolution assist feature (SRAF). By calibrating the printing model against multiple test patterns, Meiring's methodology allows for accurate predictions of printed feature dimensions and their behavior on photoresist layers.

The second patent, "Methodology of placing printing assist feature for random mask layout," outlines a novel approach for integrating printing assist features within mask layouts. This method involves generating a set of parameters related to the printing assist features, verifying their removable status based on simulation results, and establishing placement rules to optimize the final designs.

Career Highlights

Meiring's impressive career includes significant tenures at leading technology companies. He has worked with International Business Machines Corporation (IBM) and Infineon Technologies North America Corporation, where he has leveraged his expertise to drive innovations forward in the industry.

Collaborations

Throughout his career, Jason E. Meiring has collaborated with esteemed colleagues such as Henning Haffner and Scott Marshall Mansfield. These collaborations have enabled him to share insights and develop cutting-edge solutions in optical technology.

Conclusion

In summary, Jason E. Meiring's innovative patents and distinguished career mark him as a key player in the field of optical modeling and design. His contributions continue to pave the way for advanced technologies that enhance the precision of optical simulations and the functionality of mask layouts in various applications. As the landscape of technology evolves, inventors like Meiring play an essential role in shaping its future.

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