Moscow, Russia

Jaroslav V Kalinin


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Jaroslav V Kalinin: Innovator in Aerial Image Quality Measurement

Introduction

Jaroslav V Kalinin is a prominent inventor based in Moscow, Russia. He has made significant contributions to the field of optical proximity correction and aerial image quality measurement. With a total of 2 patents, Kalinin's work has advanced the technology used in chip design and image simulation.

Latest Patents

Kalinin's latest patents include innovative methods for measuring the quality of simulated aerial images. One patent describes a method that involves receiving a mask pattern for a chip design, simulating an aerial image, and calculating error areas that represent deviations from the ideal boundaries of the design. This method also includes displaying the worst quality areas for visual inspection. Another patent focuses on an optical proximity correction system that enhances the speed of local corrections for aerial images produced from masks. This system analyzes target designs and matches segments to typical case segments, resulting in adjusted aerial images that improve accuracy.

Career Highlights

Kalinin has worked with LSI Logic Corporation, where he has applied his expertise in optical proximity correction and image quality measurement. His innovative approaches have contributed to the development of more efficient and accurate imaging technologies in the semiconductor industry.

Collaborations

Some of his notable coworkers include Stanislav V Aleshin and Marina Igorevna Medvedeva. Their collaborative efforts have furthered advancements in the field of aerial image processing and correction.

Conclusion

Jaroslav V Kalinin's contributions to the field of aerial image quality measurement and optical proximity correction have established him as a key figure in the industry. His innovative patents and collaborative work continue to influence advancements in technology.

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