The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
May. 22, 2002
Marina M. Medvedeva, Moscow, RU;
Jaroslav V. Kalinin, Moscow, RU;
Stanislav V. Aleshin, Moscow, RU;
Nadya Strelkova, Mountain View, CA (US);
Marina M. Medvedeva, Moscow, RU;
Jaroslav V. Kalinin, Moscow, RU;
Stanislav V. Aleshin, Moscow, RU;
Nadya Strelkova, Mountain View, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
A method of measuring the quality of a simulated aerial image includes receiving as input a mask pattern for a chip design, simulating an aerial image of the mask pattern, calculating an error area representative of a deviation between an ideal boundary of the chip design and a boundary of the simulated aerial image, calculating maximum and average end-of-line deviations between the ideal boundary of the chip design and the boundary of the simulated aerial image, and displaying a worst quality area in the simulated aerial image as a function of the error area and the maximum and average end-of-line deviations for visual inspection.