Lsi Logic Corporation

Jaroslav V Kalinin

Stanislav V Aleshin

Marina Igorevna Medvedeva

Nadya Strelkova

Marina M Medvedeva

Sergel Rodin

A method of measuring the quality of a simulated aerial image includes receiving as input a mask pattern for a chip design, simulating an aerial image of the mask pattern, calculating an error area representative of a deviation between an ideal boundary of the chip design and a boundary of the simulated aerial image, calculating maximum and average end-of-line deviations between the ideal boundary of the chip design and the boundary of the simulated aerial image, and displaying a worst quality area in the simulated aerial image as a function of the error area and the maximum and average end-of-line deviations for visual inspection.

Quality measurement of an aerial image

An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes an analyzer to match one or more segments of the target design to one or more typical case segments from a predetermined set of typical case segments; a controller, coupled to the analyzer, for approximating each of the one or more segments of the target design with matching typical case segments from the set of typical case segments to produce an adjusted aerial image. The method for optical proximity correction using local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design, includes: a) analyzing the target design to produce one or more segments from the target design and to match the one or more segments to one or more typical case segments from a predetermined set of typical case segments; and b) approximating each of the one or more segments of the target design with the matching typical case segments from the set of typical case segments to produce an adjusted aerial image.

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Moscow, Russia

Jaroslav V Kalinin