Company Filing History:
Years Active: 2019
Title: Jaromir Vanhara: Innovator in Sample Orientation for TEM Lamella Preparation
Introduction
Jaromir Vanhara is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of materials science, particularly in the preparation of transmission electron microscopy (TEM) lamellae. His innovative approach has implications for the evaluation of circuit processing in various applications.
Latest Patents
Jaromir Vanhara holds a patent titled "Method for sample orientation for TEM lamella preparation." This patent describes a method where a substrate can be aligned for ion beam milling or other inspection processes. The technique involves obtaining an electron channeling pattern (ECP) or other electron beam backscatter pattern from the substrate. The ECP is influenced by the substrate's crystal orientation and tilt angles. By determining these angles at specific pattern values, the substrate's tilt can be compensated or eliminated using a tilt stage or by adjusting the ion beam axis. This method is particularly useful for aligning circuit substrate 'chunks' for ion beam milling, allowing for the evaluation of circuit features.
Career Highlights
Jaromir Vanhara has established himself as a key figure in his field through his innovative work. He is currently associated with FEI Company, where he continues to develop and refine techniques that enhance the capabilities of electron microscopy. His contributions have been instrumental in advancing the understanding of material properties at the microscopic level.
Collaborations
Throughout his career, Jaromir has collaborated with talented individuals such as Tomás Vystavel and Libor Strakos. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.
Conclusion
Jaromir Vanhara's work in the method for sample orientation for TEM lamella preparation showcases his innovative spirit and dedication to advancing materials science. His contributions are paving the way for future developments in electron microscopy and circuit evaluation.