Louvain-la-Neuve, Belgium

Jarno Van De Walle

This inventor holds 5 USPTO granted patents, plus 1 CIPO patent and 5 EPO patents. Top assignee: Ion Beam Applications S.a.. Active years: 2019-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jarno Van De Walle. Retrieved from https://idiyas.com/inventor/jarno-van-de-walle

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Denderleeuw, BE (2019)
  • Louvain-la-Neuve, BE (2019 - 2021)

Company Filing History:


Years Active: 2019-2021

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5 patents (USPTO):Explore Patents

Title: Innovations by Jarno Van De Walle in Charged Particle Extraction

Introduction

Jarno Van De Walle is a notable inventor based in Louvain-la-Neuve, Belgium. With a total of five patents to his name, he has made significant contributions to the field of particle physics, particularly in the area of charged particle acceleration and extraction.

Latest Patents

Among his latest patents are:

1. **Synchrocyclotron for Extracting Beams of Various Energies** - This innovative synchrocyclotron is designed to extract charged particles accelerated to an extraction energy. It features a magnetic unit comprising N valley sectors and N hill sectors, intended to create the z-component of a main magnetic field characterized by a radial tune of the successive orbits. The device includes two instability coil units to generate a field bump with a radially increasing amplitude, crucial for ensuring the correct offset amplitude at the average instability onset radius to facilitate beam extraction.

2. **Cyclotron for Extracting Charged Particles at Various Energies** - This cyclotron focuses on accelerating beams of charged particles while also extracting them. It comprises a vacuum chamber and a target support element, which includes a tubular channel leading to a target. It features first and second energy-specific extraction kits, complete with stripper assemblies located at designated stripping positions for different energies. The design allows for modified charged particles to intercept the target holder efficiently.

Career Highlights

Jarno Van De Walle is currently associated with Ion Beam Applications S.A., a leading company in the field of ion beam technology. His inventive work is recognized within the industry, contributing to advancements in charged particle applications.

Collaborations

Throughout his career, Jarno has collaborated with esteemed colleagues including Willem Kleeven and Vincent Nuttens. These partnerships have fostered an environment of innovation and creativity, significantly impacting the developments in particle beam extraction technologies.

Conclusion

Jarno Van De Walle's expertise in synchrocyclotron and cyclotron technologies showcases his role as a significant inventor in the field of charged particle physics. Through his innovative patents, he continues to push the boundaries of technology, benefiting both scientific research and practical applications in particle acceleration.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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