Jari M Makinen

Title: Jari M Makinen: Innovator in Silicon Layer Deposition and Audio Technology

Introduction

Jari M Makinen is a notable inventor based in Tampere, Finland. He holds a total of 7 patents that showcase his contributions to technology, particularly in the fields of silicon layer deposition and audio content management.

Latest Patents

One of his latest patents is a method for depositing one or more polycrystalline silicon layers on a substrate. This innovative process involves chemical vapor deposition in a reactor, where the deposition temperature is adjusted between 605°C and 800°C. The method utilizes a silicon source gas, such as SiH4 or SiH2Cl2, along with a dopant gas like BCl3 to achieve the desired results. Another significant patent is a system and method for winding audio content using a voice activity detection algorithm. This technology allows for the precise location of a playback start point after winding or rewinding audio content. The system intelligently determines if there are non-speech or silent periods near the desired playback position, ensuring a seamless listening experience.

Career Highlights

Throughout his career, Jari has worked with prominent companies, including Nokia Corporation and Okmetic Oyj. His experience in these organizations has contributed to his expertise and innovative capabilities in the technology sector.

Collaborations

Jari has collaborated with talented individuals such as Janne Vainio and Hannu J Mikkola, further enhancing his work and contributions to the field.

Conclusion

Jari M Makinen's innovative patents and career achievements reflect his significant impact on technology, particularly in silicon deposition and audio management. His work continues to influence advancements in these areas.