Company Filing History:
6 out of 164,197 
1 out of 832,843 Years Active: 1977-1993
Title: Janos Havas: Innovator in Semiconductor Technology
Introduction
Janos Havas is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His innovative work has advanced methods for forming patterned films on substrates, which are crucial in the manufacturing of semiconductor devices.
Latest Patents
One of Janos Havas's latest patents is a method for forming patterned films on a semiconductor substrate. This method includes several steps, such as depositing a hardened photo resist underlay onto the substrate, followed by a polyether sulfone release layer. A photo-sensitive resist layer is then deposited and exposed to create an etching metallization pattern. The structure is subsequently blanket deposited with a conductive layer to create a conductive contact stud. The film layer and resist layer are removed by dissolving the polyether sulfone layer in an NMP solution, while the photo resist underlayer is removed using a selective photo resist stripper composition. Another significant patent involves photo resist stripper compositions that utilize N-alkyl-2-pyrrolidone, 1,2-propanediol, and tetraalkylammonium hydroxide. These compositions are effective at high stripping temperatures to remove hard-baked photoresist without damaging semiconductor substrates or metallurgy.
Career Highlights
Throughout his career, Janos Havas has worked with prominent companies, including International Business Machines Corporation (IBM). His experience in the industry has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.
Collaborations
Janos has collaborated with notable individuals in his field, including John Anthony Fitzsimmons and John S Lechaton. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.
Conclusion
Janos Havas is a distinguished inventor whose work in semiconductor technology has led to several important patents. His innovative methods for forming patterned films and developing effective photo resist strippers have made a significant impact in the industry.