The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 1992

Filed:

May. 01, 1990
Applicant:
Inventors:

Alicia Dean, Poughkeepsie, NY (US);

John A Fitzsimmons, Poughkeepsie, NY (US);

Janos Havas, Hopewell Junction, NY (US);

Barry C McCormick, Poughkeepsie, NY (US);

Prabodh R Shah, Wappingers Falls, NY (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09D / ; C11D / ; C11D / ;
U.S. Cl.
CPC ...
252162 ; 252153 ; 252156 ; 252158 ; 252170 ; 252172 ; 252D / ;
Abstract

Photo resist stripper compositions comprising N-alkyl-2-pyrrolidone, 1,2-propanediol and tetraalkylammonium hydroxide. The photoresist strippers are useful at high stripping temperatures (105.degree. C.-125.degree. C.) to remove hard baked photoresist without damaging semiconductor substrates or metallurgy.


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