Prabodh R Shah

Title: Prabodh R Shah: Innovator in Photoresist Technology

Introduction

Prabodh R Shah is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of photoresist strippers and polyimide coatings. With a total of 2 patents, his work has had a considerable impact on the industry.

Latest Patents

One of Shah's latest patents is for a photoresist stripper composition that includes N-alkyl-2-pyrrolidone, 1,2-propanediol, and tetraalkylammonium hydroxide. This innovative composition is designed to operate at high stripping temperatures ranging from 105°C to 125°C, effectively removing hard baked photoresist without causing damage to semiconductor substrates or metallurgy. Another significant patent involves polyimide coating compositions based on meta-dialkyldihydrogen. This composition is intended for the application of a planar polyimide coating with a glass transition temperature exceeding 300°C, utilizing a solution in an anhydrous, aprotic solvent of an aromatic diamine and a dialkyldihydrogen pyromellitate that is predominantly the meta isomer.

Career Highlights

Throughout his career, Prabodh R Shah has worked with prominent companies, including International Business Machines Corporation (IBM). His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in the semiconductor field.

Collaborations

Shah has collaborated with notable coworkers, including Alicia Dean and John Anthony Fitzsimmons. These partnerships have likely fostered a creative environment that has led to the development of his patented technologies.

Conclusion

Prabodh R Shah is a distinguished inventor whose work in photoresist technology and polyimide coatings has made a lasting impact on the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology in this critical field.