This inventor holds 1 USPTO granted patent and 3 EPO patents. Top assignee: Asm International N.v.. Active years: 2010.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2010
Title: Janne Kesälä: Innovator in Thin-Film Fabrication
Introduction
Janne Kesälä is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of thin-film technology, particularly in the fabrication of semiconductor layer structures and display units. His innovative approach has led to the development of a unique apparatus that enhances the quality and cleanliness of thin films.
Latest Patents
Janne Kesälä holds a patent for an "Apparatus for fabrication of thin films." This invention relates to a system designed for growing thin films onto a substrate through alternate surface reactions of vapor-phase reactants. The apparatus includes a vacuum vessel and a reaction chamber that allows for the transfer of substrates while maintaining a clean environment. The design features infeed channels for reactants and outlet channels for gaseous products, which contribute to reducing substrate contamination during the fabrication process.
Career Highlights
Kesälä's career is marked by his work at ASM International N.V., a company renowned for its advancements in semiconductor manufacturing equipment. His expertise in thin-film growth processes has positioned him as a key player in the industry. His innovative apparatus is intended for use in atomic layer epitaxy (ALE) methods, which are critical for producing high-quality semiconductor layers.
Collaborations
Throughout his career, Janne has collaborated with notable colleagues, including Niklas Bondestam and Leif Keto. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of thin-film technology.
Conclusion
Janne Kesälä's contributions to thin-film fabrication demonstrate his commitment to advancing technology in the semiconductor industry. His innovative apparatus not only improves the cleanliness of the fabrication process but also enhances the quality of the final products. His work continues to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile