Suwon, South Korea

Janghoon Kim

This inventor holds 2 USPTO granted patents and 3 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Janghoon Kim. Retrieved from https://idiyas.com/inventor/janghoon-kim-pk0ftgnd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Janghoon Kim - Innovator in Semiconductor Manufacturing

Introduction

Janghoon Kim is an inventor based in Suwon-si, South Korea. He is known for his contributions to the field of semiconductor manufacturing. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Janghoon Kim has filed several notable patent applications. One of his applications is for a "Scanning Electron Microscope Image Distortion Correction Method, and Semiconductor Manufacturing Method Using the Correction Method." This method involves obtaining at least one SEM image of holes arranged in a two-dimensional array on a wafer. The process includes expanding peripheral holes in a minor axis direction to achieve a ratio of about 1:1 between the minor and major axes. Additionally, it ensures that the diameters of the central and peripheral holes are substantially equal.

Another significant application is for a "Method for Manufacturing Semiconductor Device and Forming Photoresist Pattern." This method outlines the steps for creating a semiconductor device, including forming a pattern formation material layer on a substrate, applying photoresist, and performing multiple cleaning processes to ensure the integrity of the photoresist pattern.

Conclusion

Janghoon Kim's innovative approaches in semiconductor manufacturing highlight his potential impact on the industry. His latest patent applications demonstrate his commitment to advancing technology in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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