Seoul, South Korea

Janggyoo Yang

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Janggyoo Yang. Retrieved from https://idiyas.com/inventor/janggyoo-yang-vyvgy12k

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Janggyoo Yang: Innovator in Plasma Processing Technology

Introduction

Janggyoo Yang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative patent. His work focuses on enhancing plasma processing technology, which is crucial for the production of semiconductor devices.

Latest Patents

Janggyoo Yang holds a patent for a "Plasma processing apparatus and method of manufacturing semiconductor device by using same." This invention includes a plasma chamber with distinct areas, equipped with radio frequency (RF) power sources that control plasma spatially and temporally. The apparatus is designed to improve the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Yang is currently employed at Samsung Electronics Ltd., a leading global technology company. His role involves research and development in semiconductor technologies, where he applies his expertise in plasma processing. His innovative approach has positioned him as a valuable asset to his team and the company.

Collaborations

Some of Janggyoo Yang's coworkers include Donghyeon Na and Kyungsun Kim. Together, they work on advancing semiconductor technologies and exploring new methods to enhance manufacturing processes.

Conclusion

Janggyoo Yang's contributions to plasma processing technology exemplify the innovative spirit of modern inventors. His work not only advances semiconductor manufacturing but also showcases the importance of collaboration in achieving technological breakthroughs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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