Jane P Chang

Title: Innovations by Jane P Chang

Introduction

Jane P Chang is a notable inventor based in Cambridge, MA (US). She has made significant contributions to the field of environmental technology, particularly in the area of metal removal processes. With a total of 3 patents, her work has garnered attention for its innovative approaches to addressing contamination issues.

Latest Patents

One of her latest patents is a UV/halogen metals removal process. This invention describes a chlorine-based dry-cleaning system that effectively removes metal contaminants from the surface of substrates. The process involves chlorinating the metal contaminant and reducing it to a volatile metal chloride through UV irradiation. The parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and the sequence of exposure to chlorine gas and ultraviolet radiation are carefully selected to achieve substantial removal of the metal without causing excessive roughening of the substrate.

Career Highlights

Throughout her career, Jane has worked with prestigious institutions, including the Massachusetts Institute of Technology. Her innovative work has positioned her as a leader in her field, contributing to advancements in environmental safety and technology.

Collaborations

Jane has collaborated with notable individuals such as Herbert H Sawin and Andrew Scott Lawing. These partnerships have further enhanced her research and development efforts.

Conclusion

Jane P Chang's contributions to the field of metal removal processes highlight her innovative spirit and dedication to environmental technology. Her patents reflect a commitment to finding effective solutions for contamination challenges.