This inventor holds 1 USPTO granted patent. Top assignee: Leland Stanford Junior University. Active years: 2023.
Company Filing History:
Years Active: 2023
Title: Jan Torgersen: Innovator in Atomic Layer Deposition
Introduction
Jan Torgersen is a notable inventor based in Stanford, California. He has made significant contributions to the field of materials science, particularly through his innovative work in atomic layer deposition.
Latest Patents
Torgersen holds a patent for a method of atomic layer deposition with passivation treatment. This method involves performing an atomic layer deposition cycle that includes introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate. Additionally, it incorporates the introduction of a passivation gas into the deposition chamber to passivate a surface of the material. This process is repeated multiple times to form a film of the material.
Career Highlights
Jan Torgersen is affiliated with Leland Stanford Junior University, where he continues to advance research in his field. His work has garnered attention for its potential applications in various technological advancements.
Collaborations
Torgersen has collaborated with esteemed colleagues such as Friedrich B Prinz and Shicheng Xu, contributing to a rich environment of innovation and research.
Conclusion
Jan Torgersen's contributions to atomic layer deposition highlight his role as a key innovator in materials science. His patent reflects a significant advancement in the field, showcasing the importance of his work at Leland Stanford Junior University.