The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2023
Filed:
Sep. 07, 2017
Applicant:
The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);
Inventors:
Friedrich B. Prinz, Stanford, CA (US);
Shicheng Xu, Stanford, CA (US);
Timothy English, Stanford, CA (US);
John Provine, Stanford, CA (US);
Dickson Thian, Stanford, CA (US);
Jan Torgersen, Stanford, CA (US);
Assignee:
The Board of Trustees of the Leland Stanford Junior University, Stanford, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/18 (2006.01); B01J 35/10 (2006.01); B01J 23/42 (2006.01); C23C 16/02 (2006.01); B01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45534 (2013.01); B01J 23/42 (2013.01); B01J 35/10 (2013.01); C23C 16/0245 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01); B01J 37/349 (2013.01);
Abstract
A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.