Hsinchu, Taiwan

Jan-Mei Fan

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jan-Mei Fan. Retrieved from https://idiyas.com/inventor/jan-mei-fan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Jan-Mei Fan

Introduction

Jan-Mei Fan is a notable inventor based in Hsinchu Hsien, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to calibration tools.

Latest Patents

Jan-Mei Fan holds a patent for a self-centering calibration tool and method of calibrating. This invention is designed for use in a chemical vapor deposition chamber, specifically for a wafer platform or heater. The self-centering calibration tool features a circular calibration disc with alignment marks for robot arm alignment. It includes a centering device that is detachably mounted to the calibration disk, allowing for precise calibration. The centering device consists of at least three links or legs that engage with an undercut groove on the wafer platform, facilitating self-centering calibration. This invention enhances the efficiency and accuracy of wafer loading processes.

Career Highlights

Jan-Mei Fan is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work has contributed to advancements in manufacturing processes and technology.

Collaborations

Jan-Mei Fan has collaborated with notable colleagues, including Chia-I Shen and Su-Hwa Wang, who have also contributed to innovations in the semiconductor field.

Conclusion

Jan-Mei Fan's contributions to the semiconductor industry through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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