Union City, CA, United States of America

James Yang


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: James Yang - Innovator in RF Technology

Introduction

James Yang is a prominent inventor based in Union City, CA (US). He has made significant contributions to the field of radio frequency (RF) technology, particularly in the area of plasma processing. His innovative approach has led to advancements that enhance the efficiency of RF power application in various industrial processes.

Latest Patents

James Yang holds a patent for a "Method and system for autotuning of RF match." This invention addresses the challenges associated with chamber impedance changes during processing. The system allows for a reactive correction without altering the process recipe, enabling automatic and repeated adjustments during operation. By controlling RF power application to a plasma processing chamber, the invention minimizes reflected power and ensures efficient RF power application. The autotuning process can be implemented using frequency matching and RF matching network tuning, making it a valuable advancement in the field.

Career Highlights

James Yang is currently employed at Advanced Micro-Fabrication Equipment, Inc. Asia, where he continues to develop innovative solutions in RF technology. His work has positioned him as a key figure in the industry, contributing to the advancement of micro-fabrication techniques.

Collaborations

James has collaborated with notable colleagues, including Stanley Liu and Zhaohui Xi. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

James Yang's contributions to RF technology through his patent and work at Advanced Micro-Fabrication Equipment, Inc. Asia highlight his role as an influential inventor in the field. His innovative methods for autotuning RF applications demonstrate the potential for improved efficiency in plasma processing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…