Company Filing History:
Years Active: 2008
Title: James Sun: Innovator in Polysilicon Technologies
Introduction
James Sun, an accomplished inventor based in Taipei, Taiwan, has made significant contributions to the field of semiconductor manufacturing. With a focus on enhancing polysilicon grain size, Sun's innovations aim to improve the quality and efficiency of silicon-based technologies.
Latest Patents
James Sun holds a patent titled "Method for Increasing Polysilicon Grain Size." This invention relates to a novel method that involves exposing a silicon oxide wafer in a deposition chamber to nitrogen at a flow rate of at least about 240 standard liters per minute. The method effectively increases the grain size of polysilicon layers while also inhibiting the formation of polysilicon seeds in a furnace. The process includes forming a silicon oxide layer on a substrate and substituting oxygen molecules with nitrogen molecules, allowing for the formation of a high-quality polysilicon layer.
Career Highlights
Sun is affiliated with Taiwan Semiconductor Manufacturing Company Ltd., a leader in the semiconductor industry. His work at this prestigious company has positioned him as a key player in advancing polysilicon technologies, contributing to the ongoing evolution of semiconductor materials and processes.
Collaborations
Throughout his career, James Sun has collaborated with esteemed colleagues such as Yao-Hui Huang and Tung-Li Lee. These partnerships have fostered innovation and have been integral to the success of his notable contributions.
Conclusion
James Sun exemplifies the spirit of innovation in the semiconductor sector. His patented methods for improving polysilicon grain size not only demonstrate his expertise as an inventor but also contribute to the advancement of technology in the semiconductor industry. As the demand for efficiency and quality in semiconductor materials continues to grow, Sun’s work will undoubtedly play a pivotal role in shaping the future of this field.