James S Wong

Title: Innovations of James S. Wong

Introduction

James S. Wong is a notable inventor based in San Jose, California. He has made significant contributions to the field of optical data storage and photomask technology. With a total of 2 patents, Wong's work has advanced the capabilities of optical devices.

Latest Patents

Wong's latest patents include a "Dichromatic photomask and a method for its fabrication." This patent describes a method for manufacturing a photomask that enables the production of dual depth features on substrates. The process involves several steps, including coating a substrate with optical filter material, opaque masking material, and dual tone photoresist, followed by selective exposure and etching.

Another significant patent is the "Patterning process for bipolar optical storage medium." This invention pertains to an optical data storage device that features guide ridges and pits formed on a substrate. The method for manufacturing this device includes applying a dual tone photosensitive material, exposing it with a laser light source, and developing it to achieve the desired bipolar geometry.

Career Highlights

James S. Wong is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to explore innovative solutions in optical technologies. Wong's contributions have been instrumental in enhancing the performance and efficiency of optical data storage devices.

Collaborations

Wong has collaborated with notable colleagues, including John C. Cheng and Timothy Martin Reith. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their respective fields.

Conclusion

James S. Wong's innovative work in optical technologies and his patents reflect his expertise and dedication to advancing the field. His contributions continue to influence the development of optical data storage and photomask technologies.