Temecula, CA, United States of America

James Richard Thurmond

This inventor holds 2 USPTO granted patents. Top assignee: Air Products and Chemicals, Inc.. Active years: 2003-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Richard Thurmond. Retrieved from https://idiyas.com/inventor/james-richard-thurmond

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Innovations of James Richard Thurmond

Introduction

James Richard Thurmond is a notable inventor based in Temecula, California. He has made significant contributions to the field of chemical vapor deposition, particularly in the electronics industry. With a total of 2 patents, his work focuses on enhancing the properties of copper-based precursors.

Latest Patents

Thurmond's latest patents include innovations that improve the performance and efficiency of copper CVD precursors. One of his inventions, titled "Copper CVD precursors with enhanced adhesion properties," relates to copper(+1)(β-diketonate)(L) and related copper complexes. This invention aims to enhance adhesion properties through a specific chemical structure involving various groups such as Calkyl, aryl, and halogen.

Another significant patent is "Use of water and acidic water to purify liquid MOCVD precursors." This invention presents an improved purification process for producing liquid copper-based complexes of &bgr;-diketones. The process involves reacting a reactive copper compound with a fluorinated &bgr;-diketonate and an organo source. Purification is achieved by contacting the reaction product with double deionized deoxygenated water, resulting in the separation of byproducts and the desired product.

Career Highlights

James Richard Thurmond is currently associated with Air Products and Chemicals, Inc., where he continues to innovate in the field of chemical vapor deposition. His work has been instrumental in advancing the technology used in electronics manufacturing.

Collaborations

Thurmond has collaborated with notable professionals in his field, including Robert Sam Zorich and Morteza Farnia. These collaborations have contributed to the development of his innovative patents and advancements in the industry.

Conclusion

James Richard Thurmond's contributions to the field of chemical vapor deposition through his patents demonstrate his commitment to innovation. His work continues to influence the electronics industry, showcasing the importance of advancements in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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