This inventor holds 1 USPTO granted patent. Top assignee: Motorola Corporation. Active years: 1999.
Company Filing History:
Years Active: 1999
Title: The Innovations of James N. Conner: A Pioneer in Lithographic Technology
Introduction: James N. Conner, based in Austin, TX, has made significant contributions to the field of lithography, specifically through his patent related to lithographic proximity correction. With a keen understanding of the complexities involved in the manufacture of integrated circuits, Conner's work demonstrates the intersection of innovation and practicality within the technology sector.
Latest Patents: James N. Conner holds a patent titled "Lithographic proximity correction through subset feature modification." This patent outlines a process whereby lithographic proximity correction (LPC) shapes are integrated into a layout database file, allowing for enhanced precision in the manufacturing of integrated circuits. The innovative method includes filtering LPC shapes based on geometric criteria, followed by modifications determined by their proximity to existing shapes in another database. This technique plays a crucial role in creating lithographic masks, which are essential for patterning wafers used in integrated circuit production.
Career Highlights: Conner has made his mark in the industry by aligning his talents with Motorola Corporation, a leader in telecommunications and semiconductor technology. His experiences and contributions have allowed him to further refine his expertise in lithographic processes, which are vital to advancing integrated circuit technologies.
Collaborations: Throughout his career, Conner has collaborated with esteemed colleagues such as Alfred J. Reich and Hak-Lay Chuang. Together, they have pushed the boundaries of lithographic technology and contributed to the continued evolution of semiconductor manufacturing processes.
Conclusion: James N. Conner exemplifies the spirit of innovation within the semiconductor industry. His patented processes in lithographic proximity correction serve as a testament to his dedication and ingenuity. As technology continues to advance, the contributions of inventors like Conner remain instrumental in shaping the future of integrated circuits and beyond.