Motorola Corporation

James N Conner

Kevin D Lucas

Alfred J Reich

Paul G Tsui

Michael E Kling

Hak-Lay Chuang

Lithographic Proximity Correction (LPC) shapes are added (503) to a layer of a layout database file (501). Geometric criteria such as feature width are then used to filter the added LPC shapes (502). The LPC shapes are then modified (505) by determining which LPC shapes are within a predetermined distance from a shape in a layer of the second data base (504). The database file, including the modified LPC shapes, is then used to manufacture a set of lithographic masks (506). The lithographic masks are then used to pattern a set of wafers in the manufacture of integrated circuits (507).

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Austin, TX, United States of America

James N Conner