James M Tyler

Title: Innovations of James M Tyler

Introduction

James M Tyler is an accomplished inventor based in Lagrangeville, NY (US). He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

One of Tyler's notable patents is titled "Low cost shallow trench isolation using non-conformal dielectric material." This patent presents a method for planarizing a structure, such as a shallow trench isolation region on a semiconductor substrate. The invention involves providing a semiconductor substrate with raised and lowered regions that have substantially vertical and horizontal surfaces. The lowered regions correspond to trench regions, and filler material, such as non-conformal high-density plasma oxide, is deposited over the horizontal surfaces. This process ensures that the filler material reaches a predetermined height, creating distinct raised and lowered regions. The raised regions can then be selectively removed without affecting the filler material in the lowered regions.

Career Highlights

James M Tyler is associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and implement innovative solutions in semiconductor technology. With a patent portfolio that includes 1 patent, Tyler has established himself as a key figure in his field.

Collaborations

Throughout his career, Tyler has collaborated with notable colleagues, including John W Andrews and Bao T Hwang. These collaborations have contributed to the advancement of technology and innovation within the industry.

Conclusion

James M Tyler's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.