James L Flack

Title: The Innovations of James L. Flack: A Pioneer in Semiconductor Manufacturing

Introduction

James L. Flack is a notable inventor based in Oviedo, Florida, with a rich contribution to the field of semiconductor manufacturing. With a total of two patents to his name, he has developed innovative systems that improve the efficiency and safety of gas management processes in the industry.

Latest Patents

James L. Flack's most recent patents showcase his expertise in managing gas flow and effluent gases during semiconductor fabrication. One of his latest inventions, the "Bypass Loop Gas Flow Calibration," focuses on monitoring the performance of mass flow controllers that supply gases essential for deposition and etching processes. This invention includes a bypass loop designed to connect with either the process line or vent line, featuring a flow detector that measures gas flow. The resulting data aids in evaluating the accuracy and precision of the mass flow controllers, and it incorporates the ability to correct back pressure or vacuum situations.

Another significant patent by Flack is the "System and Method for the Abatement of Toxic Constituents of Effluent Gases." This innovative system addresses the environmental concerns associated with toxic gases generated during semiconductor device manufacturing. It utilizes a burn/wet scrubber installed at the fabrication site to oxidize and condense hazardous compounds. The treated wastewater from this process undergoes local treatment using an ion exchange filter before being sent to a centralized facility for further processing.

Career Highlights

Flack is currently employed at Agere Systems Inc., where he applies his technical expertise to advance semiconductor manufacturing technologies. His work directly influences the effectiveness and sustainability of manufacturing processes in the industry, showcasing a commitment to innovation and environmental responsibility.

Collaborations

Throughout his career, James L. Flack has collaborated with notable colleagues, including William Daniel Bevers and Robert Francis Jones. These professional relationships have fostered an environment of shared knowledge and innovation, further enhancing the impact of their collective contributions to the semiconductor manufacturing field.

Conclusion

James L. Flack's inventions represent significant advancements in the industry's methodologies for handling gases and reducing environmental impact. His work at Agere Systems Inc. and his collaborations with esteemed coworkers exemplify his dedication to innovation, paving the way for better practices in semiconductor manufacturing. As new technologies continue to evolve, the contributions of inventors like Flack serve as foundational elements for future advancements.