The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Sep. 30, 2003
William Daniel Bevers, Orlando, FL (US);
Robert Francis Jones, Clermont, FL (US);
Bennett J. Ross, Merritt Island, FL (US);
Joseph William Buckfeller, Windermere, FL (US);
James L. Flack, Oviedo, FL (US);
William Daniel Bevers, Orlando, FL (US);
Robert Francis Jones, Clermont, FL (US);
Bennett J. Ross, Merritt Island, FL (US);
Joseph William Buckfeller, Windermere, FL (US);
James L. Flack, Oviedo, FL (US);
Agere Systems Inc., Allentown, PA (US);
Abstract
Described herein are apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes. A bypass loop is provided in fluid connection from either the process line or the vent line. In the bypass loop is a flow detector, such as a digitized mass flow controller. The flow detector takes one or more measurements of flow of gas from a mass flow controller, and data from such one or more measurements is used to provide information about the accuracy and/or precision of the mass flow controller. Also disclosed are ways to correct for back pressure or back vacuum in the process line.